Ion Beam Analysis Laboratory
Overview
Ion Beam Analysis is an enabling technology for thin film scientists and engineers. It is a powerful
group of analytical techniques for determining the elemental composition of thin films. We can get
accurate (and traceable) analyses, with good spacial resolution both laterally and in depth, and the
Surrey IBC is an acknowledged world leader in this field.
IBA techniques have recently become much more powerful, since the self-consistent analysis of photon
emission (PIXE) spectra together with particle scattering (RBS, EBS, ERD, NRA) spectra has become
available. These new methods, which we have been instrumental in developing, fully exploit the
complementary information available from the photon and particle methods: with the depth resolution and
traceability of RBS and the mass resolution and sensitivity of PIXE. And all this at the lateral
resolution given by our microbeam, and soon also our nanobeam.
We have analysed a very wide range of materials, from various electronics samples through timbers from the Cutty Sark and paint on a suspected Leonardo da Vinci painting to the metal content of proteins. If you
have a trace element problem, or you want to know what your thin film really is, then come to us!
Facilities:
We have a 2MV Tandetron
from High Voltage
Engineering
Europe installed in Summer 2001 and commissioned Easter 2002 with
two beam lines
: a microbeam
line commissioned Summer 2002 and a millibeam
line commissioned Autumn 2002.
The microbeam line is equipped with a magnetic quadrupole triplet lens
and magentic scanner unit from
Oxford Microbeams Ltd capable of focussing the beam to 1micron
diameter and scanning over 2mm square.
The millibeam is equipped with a 6 movement
goniometer from Arun
Microelectronics Ltd and a sample exchange mechanism through an
airlock.
The sample holder is 150mm * 100mm. The goniometer can turn
the sample to glancing beam incidence angles and is suitable for high
resolution depth profiling and depth profiling of H (and D) using
4He ERD.
- RBS, EBS, ERD, PIXE, selected NRA
with up to 2.5 MeV H, 6MeV 4He and 1.4MeV 3He beams.
- Multi-axis channelling with a UHV 6
movement goniometer (RBS/EBS/ERD).
- Microbeam analysis of laterally
inhomogeneous samples (PIXE/RBS/NRA).
- Cold stage analysis of delicate
samples using microbeam (RBS/EBS, PIXE, NRA)
Data
Analysis:
The unique Surrey " IBA DataFurnace
" software (based on a "simulated annealing" algorithm) enables
automatic, self-consistent analysis of multiple RBS, EBS and ERD
spectra, allowing rapid and economic quantitative analysis of large
batches of complex samples. Error bars on the depth profiles
obtained (see below) are derived using Bayesian inference
techniques. These new data reduction techniques have
revolutionised ion beam analysis, making it widely available as an
industrial characterisation tool.
We offer an analysis service to industry
Materials analysed by IBA:
Ion beam analysis can be used for many different types of thin
film samples, and here are just a few that we have looked at:
Semiconductor Materials
- Accurate determination of ion dose
for implanted samples (RBS).
- Accurate depth profiles for diffused
heterostructures (RBS).
- Silicidation kinetics (RBS).
- Annealing kinetics in implanted
single crystals from damage profiles (RBS-c).
- Light element analysis (H, C, N, O)
of amorphous group IV alloys (RBS/ERD).
Qualification and characterisation of
layered materials
- Tribological coatings such as TaC
(RBS/EBS).
- Optical multilayers (RBS).
Other Materials
- Profiles of Cl at sub-0.5% in cement
(PIXE).
- Characterisation of cement type
(PIXE).
- Major, minor and trace element
analysis of biological materials (PIXE/RBS).
- Interdiffusion of deuterium-labelled
and unlabelled polymers (NRA).
Glossary
- RBS - Rutherford
Backscattering for depth profiles of complex thin films (up to a few
microns thick and down to a few nm depth resolution).
- EBS - Elastic (i.e.
non-Rutherford) backscattering (for better C, N, O analysis).
- ERD - Elastic Recoil
Detection (used for H analysis).
- PIXE- Particle (usually
proton) Induced X-ray Emission (ppm sensitivities).
- NRA - Nuclear Reaction
Analysis (isotope specific).
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